Electron Beam Lithography Lab Report Example | Topics and Well Written Essays - 500 words

Electron institutionalize Lithography - Lab Report ExampleThe linewidth has a directly proportional linear likeness with the dosage provided. spurn dosage results in a decrease of linewidth though at very low quantities, line discontinuity dominates. The relation that defines Line Dose is-Therefore, a transmute in line dose (which in turn affects linewidth) hatful be brought about by altering the beam current, dwell time or line step- size of it (with the subsist one being inversely proportional to linewidth values).The thickness of Polymethylmethacrylate (PMMA), which is often used as a jib in EBL, also has a linearly proportional relation with linewidth (Deng et al 2005). A reduction in PMMA thickness thins down the linewidth, and this can be done by either diluting the PMMA victimization Chlorobenzene, or using A series PMMA (in Anisole). Pattern resolution is primarily limited by either aberrations, or quadrangle charge. Furthermore, the feature resolution limit is determ ined by the forward scattering (effective beam broadening) in the resist, and the put resolution limit is determined by the secondary electron travel in the resist (Broers et al 1996).Reducing the beam spot size results in a decrease of the linewidth. The beam spot size is determined by two factors - the beam current (I), and the numerical aperture () - and hence, linewidth is also affected when a change is brought about in any of these factors.